Phys Status Solidi A 1974, 23:79–86 CrossRef 8 Asdente M, Delita

Phys Status Solidi A 1974, 23:79–86.CrossRef 8. Asdente M, Delitala M: Magnetocrystalline energy, electronic charge distribution, and fermi surface of iron from a tight-binding calculation. Phys Rev 1967, 163:497–503.CrossRef 9. Naik R, Poli A, McKague D, Lukaszew A, Wenger L: Strain-induced perpendicular magnetic anisotropy of <100 > -oriented Ni-Cu superlattices. Phys Rev B 1995, 51:3549–3553.CrossRef 10. Jaswal S: Comment on “Generic source of perpendicular anisotropy in amorphous rare-earth–transition-metal films”. Phys Rev Lett 1992, 68:1440–1440.CrossRef 11. SB431542 nmr Malozemoff AP: Random-field model of

exchange anisotropy at rough ferromagnetic-antiferromagnetic interfaces. Phys Rev B 1987, 35:3679–3682.CrossRef 12. Wehner

G: Influence LY3023414 price of the angle of incidence on sputtering yields. J C646 research buy Appl Phys 1959, 30:1762.CrossRef 13. Sugai I, Oyaizu M, Takeda Y, Kawakami H, Hattori H, Kawasaki K: Influence of carbon material and sputtering angle on stripper foil lifetime. Nucl Instrum Methods Phys 2010, 613:448–452.CrossRef 14. Fu Y, Yang Z, Miyao T, Matsumoto M, Liu XX, Morisako A: Induced anisotropy in soft magnetic Fe 65 Co 35 /Co thin films. Mater Sci Eng: B 2006, 133:61–65.CrossRef 15. Fan Y, Zhao HB, Lüpke G, Hanbicki AT, Li CH, Jonker BT: Anisotropic exchange coupling and stress-induced uniaxial magnetic anisotropy in Fe/GaAs(001). Phys Rev B 2012, 85:165311.CrossRef 16. Vivas L, Vazquez M, Escrig J, Allende S, Altbir D, Leitao D, Araujo J: Magnetic anisotropy in CoNi nanowire arrays: analytical calculations and experiments. Phys Rev B 2012, 85:035439.CrossRef 17. Rahman MT, Shams NN, Lai CH, Fidler J, Suess D: Co/Pt perpendicular antidot arrays with engineered feature size and magnetic properties fabricated on anodic 4-Aminobutyrate aminotransferase aluminum oxide templates. Phys Rev B 2010, 81:014418.CrossRef 18. Jiang C, Wei W, Liu Q, Guo D, Xue D: Magnetic irreversibility of

the Fe antidot arrays film by depositing on the porous alumina templates. Appl Surf Sci 2012, 258:3723–3725.CrossRef 19. Gago R, Vázquez L, Plantevin O, Sánchez-García JA, Varela M, Ballesteros MC, Albella JM, Metzger TH: Temperature influence on the production of nanodot patterns by ion beam sputtering of Si(001). Phys Rev B 2006, 73:155414.CrossRef 20. Maruyama R, Yamazaki D, Ebisawa T, Soyama K: Development of high-reflectivity neutron supermirrors using an ion beam sputtering technique. Nucl Instrum Methods Phys 2009, 600:68–70.CrossRef 21. Völlner J, Ziberi B, Frost F, Rauschenbach B: Topography evolution mechanism on fused silica during low-energy ion beam sputtering. J Appl Phys 2011, 109:043501.CrossRef 22. Sung K, Jae L, Young C, Sung H, Kyung Y: Reversible resistive switching behaviors in NiO nanowires. Appl Phys Lett 2008, 93:033503.CrossRef 23. Fathi R, Sanjabi S, Bayat N: Synthesis and characterization of NiMn alloy nanowires via electrodeposition in AAO template. Mater Lett 2012, 66:346–348.CrossRef 24.

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